AÏT AÏSSA , Keltouma

From the characterization of structure equivalent loss tangent under different conditions (bias and temperature) obtained through propagation constant and characteristic impedance extraction of CPW line, we propose a coherent analysis of the properties of an AlN/Si interface featured with a GaN on Si HEMT technology.

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In the present paper, we describe the development of new AlN seed layers obtained by combining molecular beam epitaxy and low temperature physical vapour deposition (magnetron sputtering). It is shown that it is possible to grow thick AlN seed layers with a good in-plane crystal ordering. GaN based structures on silicon can then be regrown with...

In the present paper, we describe the development of new AlN seed layers obtained by combining molecular beam epitaxy and low temperature physical vapour deposition (magnetron sputtering). It is shown that it is possible to grow thick AlN seed layers with a good in-plane crystal ordering. GaN based structures on silicon can then be regrown with...