ALMEIDA , Bernardo Gonçalves

Ti–Si–C–ON films were deposited by DC reactive magnetron sputtering using different partial pressure ratio of oxygen (pO2) and nitrogen (pN2). Compositional analysis revealed the existence of three different growth zones for the films; (I) N/Ti = 2.1 (high atomic ratio) and low oxygen content; (II) 0.76 < N/Ti < 2.1 (intermediate atomic ratio)...

Ti–Si–C–ON films were deposited by DC reactive magnetron sputtering and their chemical properties, biofilm formation and toxicity were characterized. Based on the films composition three different growth regimes were identified on the films; (I) N/Ti = 2.11 (high atomic ratio) and low oxygen content; (II) 0.77 ≤ N/Ti ≤ 1.86 (intermediate atomic...

Detailed structural, microstructural, biofilm formation and cytotoxicity studies were performed on Ti–Si–C–ON hard coatings prepared by DC reactive magnetron sputtering, in order to evaluate the relation among these properties. Compositional analysis showed the existence of two distinct regimens; regime I: high C/Si atomic ratio (C/Si ≥ 1.42)...