BARTOLI , Florian

In this work, ammonia source molecular beam epitaxy is explored as an alternative technique to grow ScAlN/GaN High Electron Mobility Transistor heterostructures. The effect of growth temperature and ScAlN barrier thickness on 2dimensional electron gas density is investigated with capacitancevoltage measurements. A transistor with a maximum...

In this work, the electrical properties of ScAlN/GaN high electron mobility transistor (HEMT) heterostructures grown by ammonia source molecular beam epitaxy are studied. The effect of growth temperature and ScAlN barrier thickness on 2DEG carrier density is investigated with capacitance-voltage measurements. Alloyed ohmic contacts have been...

Using micro-Raman spectroscopy on MOCVD slightly n-doped GaN on sapphire structures (1.5 x 10$^{15}$ cm$^{-3}$ – 6.5 x 10$^{15}$ cm$^{-3}$), we report a method to dissociate biaxial stress contribution from n carrier concentration contribution in A1(LO) Raman peak position. For all characterized samples, the main Raman peaks A$_1$(LO) and...

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