We experimentally analyze different growth regimes of Ti thin films associated to the existence of kinetic energy-induced relaxation mechanisms in the material's network when operating at oblique geometries. For this purpose, we have deposited different films by evaporation and magnetron sputtering under similar geometrical arrangements and at...
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January 13, 2020 (v1)PublicationUploaded on: December 4, 2022
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April 19, 2023 (v1)Publication
The selective incorporation of deposition species with preferential directionality is analyzed during the growth of TiO2 thin films by magnetron sputtering. Using wisely-designed collimators, tilted nanocolumnar morphol- ogies are grown in a ballistic deposition regime, i.e. when most deposition species arrive at the film surface...
Uploaded on: April 20, 2023 -
June 6, 2017 (v1)Publication
Fully dense 3mol% Y2O3-ZrO2 (3YTZP) composites with low single wall carbon nanotube content (0.5, 1 and 1.5vol% SWNT) were prepared by colloidal processing and spark plasma sintering (SPS). SWNT were distributed at ceramic grain boundaries and also into agglomerates. Characterization of SWNT agglomerates indicated that increase in SWNT vol%...
Uploaded on: March 25, 2023 -
January 3, 2024 (v1)Publication
The morphology of numerous nanocolumnar thin films deposited by the magnetron sputtering technique at oblique geometries and at relatively low temperatures has been analyzed for materials as different as Au, Pt, Ti, Cr, TiO₂, Al, HfN, Mo, V, WO₃ and W. Despite similar deposition conditions, two characteristic nanostructures have been identified...
Uploaded on: January 5, 2024 -
June 13, 2023 (v1)Publication
The deposition of SiOx (x < 2) compound thin films by the reactive magnetron sputtering technique at oblique angles is studied from both theoretical and experimental points of view. A simple mathematical formula that links the film stoichiometry and the deposition conditions is deduced. Numerous experiments have been carried out to test this...
Uploaded on: June 15, 2023 -
June 13, 2023 (v1)Publication
Target poisoning in reactive magnetron sputtering deposition of thin films is an undesired phenomenon, well known for causing a drastic fall of the process efficiency. We demonstrate that when this technique is operated at oblique angles, films with composition raging from pure metallic to stoichiometric compound can be grown in non-poisoned...
Uploaded on: June 15, 2023 -
May 11, 2021 (v1)Publication
Nanostructuration and 2D patterning of thin films are common strategies to fabricate biomimetic surfaces and components for microfluidic, microelectronic or photonic applications. This work presents the fundamentals of a surface nanotechnology procedure for laterally tailoring the nanostructure and crystalline structure of thin films that are...
Uploaded on: March 24, 2023