GONZÁLEZ ROBLEDO , David

The strain-relaxation phenomena and the formation of a dislocation network in 2H-InN epilayers during molecular beam epitaxy are reported. Plastic and elastic strain relaxations were studied by reflection high-energy electron diffraction, transmission electron microscopy, and high resolution x-ray diffraction. Characterization of the surface...

In this work, coalescence aspects of wurtzite-III-nitride epitaxy are addressed. The coalescence phenomena have been studied in thin epilayers by means of electron and atomic force microscopies, and electron and x-ray diffractions. This study generalizes the growth parameters responsible for the rapid coalescence of III-nitride films, and...

The influence of dislocations on electron transport properties of undoped InN thin films grown by molecular-beam epitaxy on AlN 0001 pseudosubstrates is reported. The microstructure and the electron transport in InN 0001 films of varying thickness were analyzed by transmission electron microscopy and variable temperature Hall-effect...

The natural aging process of InN nanostructures by the formation of indium oxides is examined by transmission electron microscopy related techniques. Uncapped and GaN-capped InN quantum dots (QDs) on GaN/sapphire substrates were grown under the same conditions and kept at room temperature/pressure conditions. The GaN capping layer is found to...