KONCZEWICZ , L.

We present a detailed investigation of the different factors that rule the temperature dependence of the AlGaN/AlN/GaN Hall-FET devices in the temperature range 300-500 degrees C. To understand the origin of the apparent increase in drive-in current density which affects devices above 300 degrees C, several series of experiments have been done....

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This paper discusses the results of high temperature resistivity and Hall effect studies of Mg-doped GaN and AlxGa1−xN epilayers (0.05 < x < 0.23). The studied samples were grown by molecular beam epitaxy on low temperature buffers of GaN and AlN deposited on a sapphire substrate. The experiments were carried out at temperatures ranging from...