LAMBERT , R. M.

Magnetron sputtering under oblique angle deposition was used to produce Ni-containing ultra thin film anodes comprising alternating layers of gadolinium doped ceria (GDC) and yttria stabilized zirconia (YSZ) of either 200 nm or 1000 nm thickness. The evolution of film structure from initial deposition, through calcination and final reduction...

We report on the synthesis of undoped ∼5 μm YSZ-Ni porous thin films prepared by reactive pulsed DC magnetron sputtering at an oblique angle of incidence. Pre-calcination of the amorphous unmodified precursor layers followed by reduction produces a film consisting of uniformly distributed tilted columnar aggregates having extensive three-phase...

Uniform, highly porous, columnar thin films incorporating YSZ and NiO prepared by magnetron sputtering with deposition at glancing incidence exhibited stoichiometries close to that of the Y–Zr–Ni sputter target. Characterization by means of SEM, XRD, XPS and RBS revealed that the uniformly distributed nickel component in the as-deposited films...