January 2019 (v1)
Journal article
We demonstrate the growth of almost strain-free (10-11) semipolar GaN on silicon-on-insulator (SOI) substrates, with no meltbacketching and with a defect density strongly reduced compared to semipolar templates grown on patterned silicon substrates.This is carried out using SOI substrates with a very thin (∼150 nm) 6° off (001) Si top layer. By...
Uploaded on: December 4, 2022