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MICHELI , V

Last name: MICHELI

First name: V

December 8, 2010 (v1)

Journal article

Metadata-only

Intrinsic defects and their influence on the chemical and optical properties of TiO2x films

Laidani, N Cheyssac, P Perrière, J

In this work, TiO2 films produced by rf sputtering of a TiO2 target in argon and argon–oxygen plasmas were studied. The oxygen content in the feed gas was varied in a range 3–20%. The chemical composition and structure of films were characterized by Rutherford backscattering spectrometry, x-ray photoelectron spectroscopy (XPS) and x-ray...

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