Group III-V/group IV epitaxy has recently attracted much interest for applications especially in integrated photonics, or solar energy harvesting devices. For years, the pioneering works of H. Kroemer [1] that successfully identified the key issues, were taken as a reference for the understanding of III-V/Si heteroepitaxy, but recent...
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May 13, 2024 (v1)Conference paperUploaded on: October 16, 2024
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August 7, 2017 (v1)Conference paper
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June 18, 2018 (v1)Conference paper
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July 29, 2018 (v1)Conference paper
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February 17, 2019 (v1)Conference paper
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June 12, 2018 (v1)Journal article
Here, we experimentally and theoretically clarify III-V/Si crystal growth processes. Atomically resolved microscopy shows that monodomain three-dimensional islands are observed at the early stages of AlSb, AlN, and GaP epitaxy on Si, independently of misfit. It is also shown that complete III-V/Si wetting cannot be achieved in most III-V/Si...
Uploaded on: December 4, 2022 -
September 2, 2018 (v1)Conference paper
In this work, we experimentally and theoretically clarify the III-V/Si crystal growth processes. Atomically-resolved microscopy shows that mono-domain 3D islands are observed at theearly stages of AlSb, AlN and GaP molecular beam epitaxy on Si, independently of strain. It is also shown that complete III-V/Si wetting cannot be achieved in most...
Uploaded on: December 4, 2022