April 27, 2017 (v1)
Publication
This paper reports a study of the kinetic roughening of Si O2 thin films prepared by plasma-enhanced chemical vapor deposition (PECVD). Tetramethylsilane has been used as a precursor, and the synthesis has been carried out under remote and in-plasma configurations. The analysis of surface topography of the films by atomic force microscopy shows...
Uploaded on: March 27, 2023