Published 2014
| Version v1
Publication
Mesoporous Titanium Dioxide Thin Layers for Gas Sensor Applications: Vacuum Deposition and Electrochemical Anodization
Description
Titanium dioxide (TiO2) thin films were prepared by means of Anodic Spark Deposition (ASD) from thin and flat metallic titanium (Ti) films pre-deposited on high quality quartz slides by electron beam evaporation.
AFM analysis indicates the formation of uniform mesoporous layers and a definite increase (about 50%) of the film thickness upon anodisation.
The oxide mesoporous films have been characterized by XPS and Raman spectroscopy.
Raman spectra of mesoporous TiO2 films were characterized by well-defined peaks related to anatase structure.
An incomplete phase transition from anatase to rutile was observed upon annealing at temperatures up to 900 °C for 3h.
Additional details
Identifiers
- URL
- http://hdl.handle.net/11567/776833
- URN
- urn:oai:iris.unige.it:11567/776833
Origin repository
- Origin repository
- UNIGE