Published October 3, 2019 | Version v1
Publication

Growth of nanocolumnar thin films on patterned substrates at oblique angles

Description

The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposited by magnetron sputtering at oblique angles is theoretically and experimentally studied. A well‐established growth model has been used to study the interplay between the substrate topography and the thin film morphology. A critical thickness has been defined, below which the columnar growth is modulated by the substrate topography, while for thicknesses above, the impact of substrate features is progressively lost in two stages; first columns grown on taller features take over neighboring ones, and later the film morphology evolves independently of substrate features. These results have been experimentally tested by analyzing the nanocolumnar growth of SiO2 thin films on ion‐induced patterned substrates.

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University of Seville: V PPIUS

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University of Seville: VI PPIT-US

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European Development Funds program (EU-FEDER) / Spanish Ministry of Economy and Competitiveness and Agencia Estatal de Investigación (AEI) : MAT2013-40852-R

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European Development Funds program (EU-FEDER) / Spanish Ministry of Economy and Competitiveness and Agencia Estatal de Investigación (AEI) : MAT2016- 79866-R

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European Development Funds program (EU-FEDER) / Spanish Ministry of Economy and Competitiveness and Agencia Estatal de Investigación (AEI) : MAT2015-69035-R

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European Development Funds program (EU-FEDER) / Spanish Ministry of Economy and Competitiveness and Agencia Estatal de Investigación (AEI) : MAT2015-69035-REDC

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European Development Funds program (EU-FEDER) / Spanish Ministry of Economy and Competitiveness and Agencia Estatal de Investigación (AEI) : MAT2017-85089-C2-1- R

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Comunidad Autónoma de Madrid S2013/MIT-3029

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Comunidad Autónoma de Madrid IND2017/IND7668

Additional details

Created:
December 4, 2022
Modified:
December 1, 2023