Published October 25, 2019
| Version v1
Publication
Quantification of self-sputtering and implantation during pulsed laser deposition of gold
Description
This work reports on the quantification of self-sputtering and implantation occurring during pulsed
laser deposition of Au as a function of the laser fluence used to ablate the gold target. The
experimental approach includes, on one hand, in situ electrical Langmuir and optical
two-dimensional imaging probes for determining, respectively, ion and excited neutral kinetic
energy distributions. On the other hand, it includes determination of the density of i ions reaching
a substrate, and ii gold atoms deposited on a substrate as well as of a proportion of atoms that are
self-sputtered. The experimental results supported by numerical analysis show that self-sputtering
and implantation are both dominated by ions having kinetic energies 200 eV. They are a fraction
0.60–0.75 of the species arriving to the substrate for ablation laser fluences 2.7– 9.0 J cm−2.
Self-sputtering yields in the range 0.60–0.86 are determined for the same fluence range.
Abstract
Ministerio de Educación y Ciencias de España-MAT2005-06508-C02-01Abstract
Unión Europea-HPRN-CT-2002-00328Additional details
Identifiers
- URL
- https://idus.us.es/handle//11441/89883
- URN
- urn:oai:idus.us.es:11441/89883