Growth regimes of porous gold thin films deposited by magnetron sputtering at oblique incidence: from compact to columnar microstructures

Description

Growth regimes of gold thin films deposited by magnetron sputtering at oblique angles and low temperatures are studied from both theoretical and experimental points of view. Thin films were deposited in a broad range of experimental conditions by varying the substrate tilt angle and background pressure, and were analyzed by Field Emission Scanning Electron Microscopy (FESEM) and Grazing Incidence Small-Angle X-ray Scattering (GISAXS) techniques. Results indicate that the morphological features of the films strongly depend on the experimental conditions, but can be categorized within four generic microstructures, each of them defined by different bulk geometrical patterns and pore percolation depth and connectivity. With the help of a growth model, a microstructure phase diagram has been constructed where the main features of the films are depicted as a function of experimentally controllable quantities, finding a good agreement with the experimental results in all the studied cases.

Abstract

Junta de Andalucía P09-CTS- 5189, TEP5283, P10-FQM-6900

Abstract

Comunidad de Madríd S2009/MAT–1726

Abstract

Ministerio de Economía y Competitividad MAT2011-29194-C02-01, CSD2008-00023, MAT2008-06652, MAT2010-21228, MAT2010-18447

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