Published December 1, 2019 | Version v1
Journal article

2 W / mm power density of an AlGaN/GaN HEMT grown on free-standing GaN substrate at 40 GHz

Contributors

Others:

Description

In this letter, a record performance at 40 GHz obtained on AlGaN/GaN high electron mobility transistor (HEMT) grown on Hydride Vapor Phase Epitaxy (HVPE) Free-Standing GaN substrate is reported. An output power density of 2 W.mm-1 associated with 20.5 % power added efficiency and a linear power gain (Gp) of 4.2 dB is demonstrated for 70 nm gate length device. The device exhibits a maximum DC drain current density of 950 mA.mm-1 and a peak extrinsic transconductance (gm Max) of 300 mS.mm-1 at VDS = 6 V. A 100 GHz maximum intrinsic cutoff frequency fT, and a maximum intrinsic oscillation frequency f Max of 125 GHz are obtained from Sparameters measurement. This performance is very promising for HEMTs grown on Free-Standing GaN substrate.

Abstract

International audience

Additional details

Identifiers

URL
https://hal.archives-ouvertes.fr/hal-02929065
URN
urn:oai:HAL:hal-02929065v1

Origin repository

Origin repository
UNICA