Published September 17, 2018
| Version v1
Publication
Fast-ion redistribution and loss due to edge perturbations in the ASDEX Upgrade, DIII-D and KSTAR tokamaks
Description
The impact of edge localized modes (ELMs) and externally applied resonant and non-resonant magnetic perturbations
(MPs) on fast-ion confinement/transport have been investigated in the ASDEX Upgrade (AUG), DIII-D and KSTAR
tokamaks. Two phases with respect to the ELM cycle can be clearly distinguished in ELM-induced fast-ion losses.
Inter-ELM losses are characterized by a coherent modulation of the plasma density around the separatrix while
intra-ELM losses appear as well-defined bursts. In high collisionality plasmas with mitigated ELMs, externally
applied MPs have little effect on kinetic profiles, including fast-ions, while a strong impact on kinetic profiles is
observed in low-collisionality, low
q
95
plasmas with resonant and non-resonant MPs. In low-collisionality H-mode
plasmas, the large fast-ion filaments observed during ELMs are replaced by a loss of fast-ions with a broad-band
frequency and an amplitude of up to an order of magnitude higher than the neutral beam injection prompt loss signal
without MPs. A clear synergy in the overall fast-ion transport is observed between MPs and neoclassical tearing
modes. Measured fast-ion losses are typically on banana orbits that explore the entire pedestal/scrape-off layer. The
fast-ion response to externally applied MPs presented here may be of general interest for the community to better
understand the MP field penetration and overall plasma response.
Abstract
Ministerio de Economía y Empresa ((RYC-2011-09152 y ENE2012-31087)Abstract
Marie Curie (Grant PCIG11-GA-2012-321455)Abstract
US Department of Energy (DE-FC02-04ER54698, SC-G903402, DE-FG02-04ER54761, DE-AC02-09CH11466 and DE-FG02- 08ER54984)Abstract
NRF Korea contract 2009-0082012Abstract
MEST under the KSTAR projectAdditional details
Identifiers
- URL
- https://idus.us.es/handle//11441/78549
- URN
- urn:oai:idus.us.es:11441/78549
Origin repository
- Origin repository
- USE