Mesoporous Titanium Dioxide Thin Films on Quartz via Electrochemical Anodisation Process

Description

Titanium dioxide (TiO2) thin films were prepared by means of electrochemical anodisation or anodic spark deposition (ASD) from thin and flat metallic titanium (Ti) films pre-deposited on high quality quartz substrates by electron beam evaporation. AFM analysis indicates the formation of uniform mesoporous layers and a definite increase about 50% of the film thickness upon anodisation and about 90% upon annealing. Anodised mesoporous TiO2 films have been characterized by Raman spectroscopy, which indicates the presence of well-defined peaks related to anatase structure. Phase transformation from anatase to rutile was observed after annealing at temperatures up to 900°C for 3h.

Additional details