Published 2006
| Version v1
Journal article
Low temperature electron mobility and concentration under the gate of AlGaN/GaN field effect transistors
Contributors
Others:
- Groupe d'étude des semiconducteurs (GES) ; Université Montpellier 2 - Sciences et Techniques (UM2)-Centre National de la Recherche Scientifique (CNRS)
- Centre de recherche sur l'hétéroepitaxie et ses applications (CRHEA) ; Université Nice Sophia Antipolis (1965 - 2019) (UNS) ; COMUE Université Côte d'Azur (2015-2019) (COMUE UCA)-COMUE Université Côte d'Azur (2015-2019) (COMUE UCA)-Centre National de la Recherche Scientifique (CNRS)-Université Côte d'Azur (UCA)
- Institute of Experimental Physics [Warsaw] (IFD) ; Faculty of Physics [Warsaw] (FUW) ; University of Warsaw (UW)-University of Warsaw (UW)
Description
High electron mobility field effect transistors were fabricated on AlGaN/GaN heterostructures and their magnetoresistance was measured at 4.2 K up to 10 T with simultaneous modulation of the gate potential. Low and high magnetic field data were used to determine the electron mobility (mu) and concentration (n), respectively, in the gated part of the transistor channel. With these measurements we present a method to determine mu and n under the gate of a transistor, which does not require knowledge of the transistor gate length, access resistance, threshold voltage, or capacitance. We discuss applications of this method for nanometer and ballistic transistors. (c) 2006 American Institute of Physics.
Additional details
Identifiers
- URL
- https://hal.archives-ouvertes.fr/hal-00543860
- URN
- urn:oai:HAL:hal-00543860v1
Origin repository
- Origin repository
- UNICA