Strain and wafer curvature of 3C-SiC films on silicon : influence of the growth conditions

Creators: Zielinski, Marcin; Ndiaye, S.; Chassagne, Thierry; Juillaguet, Sandrine; Lewandowska, Renata; Portail, Marc; Leycuras, André; Camassel, Jean

Others:: NOVASiC ; NOVASiC; Centre de recherche sur l'hétéroepitaxie et ses applications (CRHEA) ; Université Nice Sophia Antipolis (1965 - 2019) (UNS) ; COMUE Université Côte d'Azur (2015-2019) (COMUE UCA)-COMUE Université Côte d'Azur (2015-2019) (COMUE UCA)-Centre National de la Recherche Scientifique (CNRS)-Université Côte d'Azur (UCA); Groupe d'étude des semiconducteurs (GES) ; Université Montpellier 2 - Sciences et Techniques (UM2)-Centre National de la Recherche Scientifique (CNRS)

Description

We study the influence of the growth conditions on the residual strain and related optical and structural properties in the case of 3C-SiC films grown on (001) silicon substrates. We show that two possible mechanisms compete to manage the final sample bow: one is by controlling the composition of the gaseous phase (C/Si ratio) the other one by adjusting the growth temperature and duration (creep effect). In both cases, we compare the low temperature photoluminescence spectra of samples grown under tensile or compressive final stress. We show that better results can be obtained when using the creep effect.

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Strain and wafer curvature of 3C-SiC films on silicon : influence of the growth conditions

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