Published February 8, 2016
| Version v1
Publication
Dielectric breakdown of SiO2 thin films deposited by ion beam induced and plasma enhanced CVD
Additional details
Identifiers
- URL
- https://idus.us.es/handle/11441/34293
- URN
- urn:oai:idus.us.es:11441/34293
Origin repository
- Origin repository
- USE