GaN/AlN bilayers for integrated photonics

Description

III-Nitride semiconductors offer a versatile platform for integrated photonic circuits operating from the ultraviolet to the near-infrared spectral range. Either pure AlN or pure GaN waveguiding layers have usually been investigated so far. In this work, we report on the study of GaN/AlN bilayers epitaxially-grown on a sapphire substrate for photonic circuits. Quality factors up to 410,000 are demonstrated with microring resonators in the near-infrared spectral range. We emphasize the peculiar advantages of these bilayers for nonlinear photonics: GaN offers a larger nonlinear susceptibility as compared to AlN. More importantly, both materials exhibit nonlinear susceptibilities with opposite signs that can be advantageous for nonlinear conversion. Thick epitaxial III-nitride bilayers are associated with the occurrence of cracks in the epi-layers and multimode waveguide propagation. We show that the multimode character can lead to peculiar resonance line shapes with the capacity to control full transmission and reflection by phase engineering.

Abstract

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