Published June 25, 2020 | Version v1
Conference paper

Recessed and P-GaN regrowth gate development for normally-off AlGaN/GaN HEMTs

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Description

A new normally-off AlGaN/GaN HEMT structure is proposed. The regrowth of a P-GaN layer on the AlGaN/GaN heterostructure after the gate recess allows the achievement of the enhancement mode. A shift in the threshold voltage to positive values has been proved through simulation results. A precise control of the etch depth for the gate recess is detailed.

Abstract

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Identifiers

URL
https://hal.laas.fr/hal-02922723
URN
urn:oai:HAL:hal-02922723v1

Origin repository

Origin repository
UNICA