Epitaxial orientation of III-nitrides grown on R-plane sapphire by metal-organic-vapor-phase epitaxy
- Creators
- Vennegues, Philippe
- Bougrioua, Zahia
- Others:
- Centre de recherche sur l'hétéroepitaxie et ses applications (CRHEA) ; Université Nice Sophia Antipolis (1965 - 2019) (UNS) ; COMUE Université Côte d'Azur (2015-2019) (COMUE UCA)-COMUE Université Côte d'Azur (2015-2019) (COMUE UCA)-Centre National de la Recherche Scientifique (CNRS)-Université Côte d'Azur (UCA)
- Institut d'Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN) ; Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
Description
The absolute epitaxial relationships between III-nitride films and R-plane sapphire are investigated using convergent beam electron diffraction. The resulting relationships are found to be[1−100]III-N‖‖[11−20]sapphire and [0001]III-N‖‖[−1101]sapphire, respectively. The O–Al bonds in the sapphire surface are antiparallel to the N-III bonds in the III-N films. High-resolution transmission electron microscopy shows that the AlN nucleation layer is asymmetrically strained. Along its c direction, the AlN layer is in extension whereas it is relaxed perpendicular to c;.This work is supported by the EU RTN Marie-Curie contract MRTN-CT2004-005583 (PARSEM). The authors want to thank I. Sellers for a critical reading of this letter.
Abstract
International audience
Additional details
- URL
- https://hal.archives-ouvertes.fr/hal-02906710
- URN
- urn:oai:HAL:hal-02906710v1
- Origin repository
- UNICA