AlGaN Channel HEMTs for High Voltage Applications
- Others:
- Institut d'Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN) ; Centrale Lille-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-JUNIA (JUNIA) ; Université catholique de Lille (UCL)-Université catholique de Lille (UCL)
- WIde baNd gap materials and Devices - IEMN (WIND - IEMN) ; Institut d'Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN) ; Centrale Lille-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-JUNIA (JUNIA) ; Université catholique de Lille (UCL)-Université catholique de Lille (UCL)-Centrale Lille-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-JUNIA (JUNIA) ; Université catholique de Lille (UCL)-Université catholique de Lille (UCL)
- Centre de recherche sur l'hétéroepitaxie et ses applications (CRHEA) ; Université Nice Sophia Antipolis (1965 - 2019) (UNS) ; COMUE Université Côte d'Azur (2015-2019) (COMUE UCA)-COMUE Université Côte d'Azur (2015-2019) (COMUE UCA)-Centre National de la Recherche Scientifique (CNRS)-Université Côte d'Azur (UCA)
- anrProject projanr-38042 (Réseau national sur GaN) (GANEX)
- MRS 2022 spring meeting
- Renatech Network
- PCMP CHOP
- ANR-11-LABX-0014,GANEX,Réseau national sur GaN(2011)
Description
GaN high electron mobility transistors (HEMT) are becoming the mainstream for high frequency and power switching applications. Devices and circuits based on these emerging materials are more suited to operate at higher voltages and temperatures than Si-based devices owing to their superior physical properties. Recently, AlGaN/GaN based high electron mobility transistors (HEMTs) on low cost silicon substrate have been extensively demonstrated as attractive candidates for next generation power devices in the 100-650V range with low on-resistances. On the other hand, Ultra-Wide Band Gap (UWBG) materials such as AlN that has a bandgap of 6.2 eV are attracting attention for pushing the limits and address new requirements of high voltage power devices. In this presentation, we will discuss various device designs and preliminary results already showing the advantages and benefits of these new material systems for high voltage applications.
Abstract
Symposium EQ01 - Ultra-Wide Bandgap Materials and Devices, EQ01.14
Abstract
International audience
Additional details
- URL
- https://hal.archives-ouvertes.fr/hal-03637419
- URN
- urn:oai:HAL:hal-03637419v1
- Origin repository
- UNICA