BARRANCO QUERO , Ángel

Switchable mechanically induced changes in the wetting behavior of surfaces are of para-mount importance for advanced microfluidic, self‐cleaning and biomedical applications. In this work we show that the well‐known polydimethylsiloxane (PDMS) elastomer develops self‐patterning when it is coated with nanostructured TiO2 films prepared by...

The incorporation of a prototypical rosamine fluorescent dye from organic solutions into transparent and microstructured columnar TiO2 and SiO2 (MO2) thin films, prepared by evaporation at glancing angles (GAPVD), was evaluated. The aggregation of the adsorbed molecules, the infiltration efficiency and the adsorption kinetics were studied by...

Herein, we present the result of combining, for the first time, the techniques of colloidal self-assembly and plasma-enhanced chemical vapor deposition to create a novel, high-quality, purely organic active photonic crystal structure of controlled optical properties. We show a fast, reliable, and accurate procedure to introduce two-dimensional...

A flexible distributed Bragg reflector is made by the infiltration of a nanocolumnar array with polydimethyl siloxane oligomers. The high optical reflectance displayed by the final material is a direct consequence of the high refractive index contrast of the columnar layers whereas the structural stability is due to the polymer properties.

The oblique angle configuration has emerged as an invaluable tool for the deposition of nanostructured thin films. This review develops an up to date description of its principles, including the atomistic mechanisms governing film growth and nanostructuration possibilities, as well as a comprehensive description of the applications benefiting...

The microstructure and the scaling properties of films grown by plasma enhanced chemical vapor deposition are reproduced with a discrete model that takes into account the angular distribution function of the particles and the lateral growth of the films. Both the experimental and simulated surfaces exhibit a granular microstructure and an...

ITO thin films have been prepared by electron beam evaporation at oblique angles (OA), directly and while assisting their growth with a downstream plasma. The films microstructure, characterized by scanning electron microscopy, atomic force microscopy and glancing incidence small angle X-ray scattering, consisted of tilted and separated...

The growth of nanostructured physical vapor deposited thin films at oblique angles is becoming a hot topic for the development of a large variety of applications. Up to now, empirical relations, such as the so-called tangent rule, have been uncritically applied to account for the development of the nanostructure of these thin films even when...

SiOx thin films with different stoichiometries from SiO1.3 to SiO1.8 have been prepared by evaporation of silicon monoxide in vacuum or under well-controlled partial pressures of oxygen (P<10–6 Torr). These thin films have been characterized by x-ray photoemission and x-ray-absorption spectroscopies, this latter at the Si K and L2,3 absorption...

The growth of TiO2 thin films prepared by plasma enhanced chemical vapor deposition has been studied by analyzing their roughness with the concepts of the dynamic scaling theory. Differences in the growth and roughness exponents have been found depending on the composition of the plasma by using either O2 or mixtures Ar+ O2 as plasma gas and...