This work focus on growth and characterization of GaN Nanowires (NWs) and Microwires (µWs). Such structures are obtained by Metal Organic Vapor Phase Epitaxy with two growth strategies: one called self-organized which is realized on sapphire, and the other named selective area growth which is obtained on a GaN Ga-polar template. Whatever the...
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May 20, 2014 (v1)PublicationUploaded on: March 26, 2023
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December 2020 (v1)Journal article
Selective area thermal etching (SATE) of gallium nitride is a simple subtractive process for creating novel device architectures and improving the structural and optical quality of III-nitridebased devices. In contrast to plasma etching, it allows, for example, the creation of enclosed features with extremely high aspect ratios without...
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April 1, 2019 (v1)Journal article
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July 30, 2024 (v1)Journal article
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July 27, 2021 (v1)Journal article
Thermal properties have an outsized impact on efficiency and sensitivity of devices with nanoscale structures, such as in integrated electronic circuits. A number of thermal conductivity measurements for semiconductor nanostructures exist, but are hindered by the diffraction limit of light, the need for transducer layers, the slow-scan rate of...
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September 7, 2022 (v1)Journal article
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June 1, 2022 (v1)Conference paper
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June 23, 2023 (v1)Journal article
In this paper, we report the use of three pendeo-epitaxy growth approaches as a way of reducing the threading dislocation density (TDD) of 20 × 20 μm$^2$ GaN platelets to be used for the development of micro light-emitting diodes (μLEDs). The method relies on the coalescence of GaN crystallites grown on top of a network of deformable pillars...
Uploaded on: November 30, 2023 -
December 2019 (v1)Journal article
Nano-engineering III-Nitride semiconductors offers a route to further control the material and optoelectronic properties, enabling novel functionalities and applications. Although various lithography techniques are employed to nano-engineer these materials, the scalability and cost of the fabrication process can be an obstacle for...
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May 2023 (v1)Journal article
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Uploaded on: May 11, 2023