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February 8, 2016 (v1)PublicationUploaded on: March 24, 2023
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June 13, 2023 (v1)Publication
The deposition of SiOx (x < 2) compound thin films by the reactive magnetron sputtering technique at oblique angles is studied from both theoretical and experimental points of view. A simple mathematical formula that links the film stoichiometry and the deposition conditions is deduced. Numerous experiments have been carried out to test this...
Uploaded on: June 15, 2023 -
October 10, 2019 (v1)Publication
Growth of amorphous SiO2 thin films deposited by reactive magnetron sputtering at low temperatures has been studied under different oxygen partial pressure conditions. Film microstructures varied from coalescent vertical column-like to homogeneous compact microstructures, possessing all similar refractive indexes. A discussion on the process...
Uploaded on: March 27, 2023 -
February 8, 2016 (v1)Publication
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Uploaded on: December 4, 2022