The epitaxial growth of III-N semiconductors in non-or semi-polar orientations avoids the effects associated with the existence of internal fields in GaN-based hetero-structures usually epitaxial in the cdirection. The thesis work that we will present is part of the search for ways to optimize the crystalline structure of the epitaxial layers...
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September 10, 2019 (v1)PublicationUploaded on: December 4, 2022
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November 1, 2020 (v1)Journal article
International audience
Uploaded on: December 3, 2022 -
January 2019 (v1)Journal article
We demonstrate the growth of almost strain-free (10-11) semipolar GaN on silicon-on-insulator (SOI) substrates, with no meltbacketching and with a defect density strongly reduced compared to semipolar templates grown on patterned silicon substrates.This is carried out using SOI substrates with a very thin (∼150 nm) 6° off (001) Si top layer. By...
Uploaded on: December 4, 2022