Based on an already tested laboratory procedure, a new magnetron sputtering methodology to simultaneously coat two-sides of large area implants (up to ~15 cm2) with Ti nanocolumns in industrial reactors has been developed. By analyzing the required growth conditions in a laboratory setup, a new geometry and methodology have been proposed and...
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February 25, 2020 (v1)PublicationUploaded on: December 5, 2022
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October 3, 2019 (v1)Publication
The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposited by magnetron sputtering at oblique angles is theoretically and experimentally studied. A well‐established growth model has been used to study the interplay between the substrate topography and the thin film morphology. A critical thickness has...
Uploaded on: December 4, 2022 -
March 18, 2022 (v1)Publication
It is demonstrated that, besides classical nanocolumnar arrays, the oblique angle geometry induces the growth of singular structures in the nanoscale when using wisely designed patterned substrates. Well-ordered array of crosses, cylindrical nanorods or hole structures arranged in square or hexagonal regular geometries are reported as examples,...
Uploaded on: December 4, 2022