The measurement of the electron mean kinetic energy by identifying the electron temperature and the excitation temperature obtained by optical emission spectroscopy is theoretically studied for two temperature argon plasmas at atmospheric pressure. Using a 32-level collisional radiative model in which both electron impact and argon-impact...
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February 26, 2019 (v1)PublicationUploaded on: December 4, 2022
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September 20, 2017 (v1)Publication
The present work proposes the use of a TiO2 electrode coupled to a one-dimensional photonic crystal (1DPC), all formed by the sequential deposition of nanocolumnar thin films by physical vapor oblique angle deposition (PV-OAD), to enhance the optical and electrical performance of DSCs while transparency is preserved. We demonstrate that this...
Uploaded on: December 4, 2022 -
July 18, 2017 (v1)Publication
The microstructure and the scaling properties of films grown by plasma enhanced chemical vapor deposition are reproduced with a discrete model that takes into account the angular distribution function of the particles and the lateral growth of the films. Both the experimental and simulated surfaces exhibit a granular microstructure and an...
Uploaded on: March 27, 2023 -
February 13, 2023 (v1)Publication
This work reports a phenomenological comparative study of atmospheric pressure barrier plasmas using ferroelectric (ferroelectric barrier discharge (FBD)) and dielectric (dielectric barrier discharge (DBD)) plates to moderate the discharge. For FBD operation and large inter-electrode distances, experiments with helium carried out in a parallel...
Uploaded on: March 1, 2023 -
April 27, 2017 (v1)Publication
This paper reports a study of the kinetic roughening of Si O2 thin films prepared by plasma-enhanced chemical vapor deposition (PECVD). Tetramethylsilane has been used as a precursor, and the synthesis has been carried out under remote and in-plasma configurations. The analysis of surface topography of the films by atomic force microscopy shows...
Uploaded on: March 27, 2023 -
April 24, 2018 (v1)Publication
En este trabajo se describen los plasmas fríos moleculares y los procesos clave que intervienen en su formación, cómo obtenerlos en laboratorio y construir modelos que nos ayuden a entenderlos mejor. Se explican también los mecanismos que proporcionan a estos plasmas una de sus características más notables: su gran reactividad química a baja...
Uploaded on: March 27, 2023 -
January 27, 2022 (v1)Publication
Carbon dioxide decomposition is a challenging target to combat climate change. Nonthermal plasmas are advantageous for this purpose because they operate at ambient conditions and can be easily scaled-up. In this study, we attempt the CO2 splitting into CO and O2 in a parallel plate packed-bed plasma reactor moderated with Lead Zirconate...
Uploaded on: December 4, 2022 -
March 6, 2019 (v1)Publication
The oblique angle configuration has emerged as an invaluable tool for the deposition of nanostructured thin films. This review develops an up to date description of its principles, including the atomistic mechanisms governing film growth and nanostructuration possibilities, as well as a comprehensive description of the applications benefiting...
Uploaded on: December 4, 2022 -
August 1, 2017 (v1)Publication
Iron oxide thin films as hematite (α-Fe2O3) have been prepared by ion beam induced chemical vapor deposition. Very compact and dense films are obtained by this procedure. The thin films have been grown by ombardment of the substrate surfaces with O2+ ions or mixtures of O2+ and Ar+ ions, while a volatile precursor of iron [i.e., Fe(CO)5] is...
Uploaded on: December 4, 2022 -
December 1, 2023 (v1)Publication
Procedimiento para la preparación de capas finas porosas de óxidos inorgánicos. El objeto de la presente invención es un procedimiento para la preparación de capas finas de óxidos inorgánicos sobre substratos mediante la deposición desde fase vapor asistida por plasma que se diferencia de los procedimientos habituales porque se intercalan entre...
Uploaded on: December 3, 2023 -
April 25, 2018 (v1)Publication
In the present work we have investigated the relationships existing between the optical properties and the growth mechanism, microstructure and surface roughness of SnO2 and ZnO oxide films prepared by magnetron sputtering under conditions resembling those utilized in industry. Thin films of these oxides with different thicknesses were...
Uploaded on: March 27, 2023 -
May 7, 2018 (v1)Publication
Herein we present a synthetic route to attain porous one-dimensional photonic crystals of high optical quality. The method employed, based on the alternate deposition of TiO2 and SiO2 porous layers by glancing angle physical vapour deposition, yields a highly accessible interconnected pore network throughout the entire multilayer structure....
Uploaded on: March 27, 2023 -
April 27, 2017 (v1)Publication
The growth of TiO2 thin films prepared by plasma enhanced chemical vapor deposition has been studied by analyzing their roughness with the concepts of the dynamic scaling theory. Differences in the growth and roughness exponents have been found depending on the composition of the plasma by using either O2 or mixtures Ar+ O2 as plasma gas and...
Uploaded on: March 27, 2023