Selective area thermal etching (SATE) of gallium nitride is a simple subtractive process for creating novel device architectures and improving the structural and optical quality of III-nitridebased devices. In contrast to plasma etching, it allows, for example, the creation of enclosed features with extremely high aspect ratios without...
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December 2020 (v1)Journal articleUploaded on: December 4, 2022
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April 1, 2019 (v1)Journal article
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July 30, 2024 (v1)Journal article
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July 27, 2021 (v1)Journal article
Thermal properties have an outsized impact on efficiency and sensitivity of devices with nanoscale structures, such as in integrated electronic circuits. A number of thermal conductivity measurements for semiconductor nanostructures exist, but are hindered by the diffraction limit of light, the need for transducer layers, the slow-scan rate of...
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September 7, 2022 (v1)Journal article
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December 2019 (v1)Journal article
Nano-engineering III-Nitride semiconductors offers a route to further control the material and optoelectronic properties, enabling novel functionalities and applications. Although various lithography techniques are employed to nano-engineer these materials, the scalability and cost of the fabrication process can be an obstacle for...
Uploaded on: December 4, 2022