YANGUAS GIL , Alejandro

The measurement of the electron mean kinetic energy by identifying the electron temperature and the excitation temperature obtained by optical emission spectroscopy is theoretically studied for two temperature argon plasmas at atmospheric pressure. Using a 32-level collisional radiative model in which both electron impact and argon-impact...

The microstructure and the scaling properties of films grown by plasma enhanced chemical vapor deposition are reproduced with a discrete model that takes into account the angular distribution function of the particles and the lateral growth of the films. Both the experimental and simulated surfaces exhibit a granular microstructure and an...

This paper reports a study of the kinetic roughening of Si O2 thin films prepared by plasma-enhanced chemical vapor deposition (PECVD). Tetramethylsilane has been used as a precursor, and the synthesis has been carried out under remote and in-plasma configurations. The analysis of surface topography of the films by atomic force microscopy shows...

The growth of TiO2 thin films prepared by plasma enhanced chemical vapor deposition has been studied by analyzing their roughness with the concepts of the dynamic scaling theory. Differences in the growth and roughness exponents have been found depending on the composition of the plasma by using either O2 or mixtures Ar+ O2 as plasma gas and...

Hydrogen production through plasma reforming of ethanol at room temperature and moderate pressure has been carried out in a microwave surface-wave reactor. Both pure ethanol and mixtures ethanol-water have been studied. The reforming yield was almost 100% in all conditions with H2, solid carbon, CO and CO2 as the main reaction products. In the...