In the last few years, several papers have appeared showing the capabilities of electron Rutherford backscattering spectrometry (eRBS) to quantify the H content at surfaces. The basis of the H detection in this technique relies on the difference in recoil energy of the incident electrons depending on the mass of the atoms located at the surface...
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April 25, 2018 (v1)PublicationUploaded on: December 4, 2022
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November 23, 2015 (v1)Publication
Mixed Zr–Si oxide thin films have been prepared at room temperature by ion beam decomposition of organometallic volatile precursors. The films were flat and amorphous. They did not present phase segregation of the pure single oxides. A significant amount of impurities (–C–, –CHx, –OH, and other radicals coming from partially decomposed...
Uploaded on: December 2, 2022 -
November 23, 2015 (v1)Publication
Mixed oxides ZrxSi1−xO2 (0bxb1) thin films have been prepared at room temperature by decomposition of (CH3CH2O)3SiH and Zr[OC (CH3)3]4 volatile precursors induced by mixtures of O2 + and Ar+ ions. The films were flat and amorphous independently of the Si/Zr ratio and did not present phase segregation of the pure single oxides (SiO2 and ZrO2). A...
Uploaded on: December 4, 2022 -
February 21, 2018 (v1)Publication
Compact Si–Ti–O and Si–Zr–O mixed oxide thin films are studied by optical characterization refractive index, band gap energy and local probes Auger parameter obtained by x-ray photoelectron spectroscopy . Interpretation of the obtained results is discussed in the framework of the classical dielectric theory that correlates the macroscopic...
Uploaded on: March 27, 2023 -
August 1, 2017 (v1)Publication
Iron oxide thin films as hematite (α-Fe2O3) have been prepared by ion beam induced chemical vapor deposition. Very compact and dense films are obtained by this procedure. The thin films have been grown by ombardment of the substrate surfaces with O2+ ions or mixtures of O2+ and Ar+ ions, while a volatile precursor of iron [i.e., Fe(CO)5] is...
Uploaded on: December 4, 2022 -
December 1, 2023 (v1)Publication
Procedimiento para la preparación de capas finas porosas de óxidos inorgánicos. El objeto de la presente invención es un procedimiento para la preparación de capas finas de óxidos inorgánicos sobre substratos mediante la deposición desde fase vapor asistida por plasma que se diferencia de los procedimientos habituales porque se intercalan entre...
Uploaded on: December 3, 2023 -
February 22, 2019 (v1)Publication
The initial stages of growth of zirconia nanoparticles deposited on SiO2, Y2O3, and CeO2 substrates have been studied by the x-ray photoelectron spectroscopy peak shape analysis. ZrO2 was deposited by plasma decomposition of a volatile Zr(OtBu)4 precursor. The electronic interactions at each particular interface formed have been followed by...
Uploaded on: December 4, 2022 -
February 21, 2023 (v1)Publication
Sculptured porous Bragg Microcavities (BMs) formed by the successive stacking of columnar SiO2 and TiO2 thin films with zig-zag columnar microstructure are prepared by glancing angle deposition. These BMs act as wavelength dependent optical retarders. This optical behavior is attributed to a self-structuration mechanism involving a...
Uploaded on: March 1, 2023 -
January 10, 2018 (v1)Publication
Magnetron sputtering under oblique angle deposition was used to produce Ni-containing ultra thin film anodes comprising alternating layers of gadolinium doped ceria (GDC) and yttria stabilized zirconia (YSZ) of either 200 nm or 1000 nm thickness. The evolution of film structure from initial deposition, through calcination and final reduction...
Uploaded on: December 2, 2022 -
February 25, 2019 (v1)Publication
SiOx thin films with different stoichiometries from SiO1.3 to SiO1.8 have been prepared by evaporation of silicon monoxide in vacuum or under well-controlled partial pressures of oxygen (P<10–6 Torr). These thin films have been characterized by x-ray photoemission and x-ray-absorption spectroscopies, this latter at the Si K and L2,3 absorption...
Uploaded on: March 27, 2023 -
November 15, 2018 (v1)Publication
We report on the synthesis of undoped ∼5 μm YSZ-Ni porous thin films prepared by reactive pulsed DC magnetron sputtering at an oblique angle of incidence. Pre-calcination of the amorphous unmodified precursor layers followed by reduction produces a film consisting of uniformly distributed tilted columnar aggregates having extensive three-phase...
Uploaded on: December 5, 2022 -
August 1, 2017 (v1)Publication
Synthesis of porous SiO2 thin films in room temperature was carried out using plasma enhanced chemical vapor deposition (CVD) in an electron cyclotron resonance microwave reactor with a downstream configuration.The gas adsorption properties and the type of porosity of the SiO2 thin films were assessed by adsorption isotherms of toluene at room...
Uploaded on: December 4, 2022 -
April 25, 2018 (v1)Publication
This work reports a procedure to modify the surface nanostructure of TiO2 anatase thin films through ion beam irradiation with energies in the keV range. Irradiation with N+ ions leads to the formation of a layer with voids at a depth similar to the ion-projected range. By setting the ion-projected range a few tens of nanometers below the...
Uploaded on: March 27, 2023 -
November 22, 2017 (v1)Publication
Uniform, highly porous, columnar thin films incorporating YSZ and NiO prepared by magnetron sputtering with deposition at glancing incidence exhibited stoichiometries close to that of the Y–Zr–Ni sputter target. Characterization by means of SEM, XRD, XPS and RBS revealed that the uniformly distributed nickel component in the as-deposited films...
Uploaded on: March 27, 2023 -
April 4, 2018 (v1)Publication
A compact and portable optofluidic microresonator has been fabricated and characterized. It is based on a Fabry-Perot microcavity consisting essentially of two tailored dichroic Bragg mirrors prepared by reactive magnetron sputtering deposition. The microresonator has been filled with an ethanol solution of Nile-Blue dye. Infrared laser...
Uploaded on: March 27, 2023 -
November 19, 2015 (v1)Publication
InTaO4 and In0.9Ni0.1TaO4 thin films have been prepared by electron evaporation of successive layers of the single oxide components and posterior annealing at T 800 °C. The annealed thin films presented the monoclinic crystallographic structure typical of these mixed oxides. The electrical and optical behaviors of the films, assessed by C-V...
Uploaded on: March 24, 2023 -
February 13, 2019 (v1)Publication
Colored semi-transparent Cu-Si oxide thin films have been prepared by reactive magnetron sputtering from a single cathode of copper-silicon composition. Thin films of different composition and optical response were obtained by changing process parameters like the relative amount of copper in the target and the O2/Ar mixture of the reactive...
Uploaded on: March 27, 2023 -
August 1, 2017 (v1)Publication
Silicon dioxide thin films have been prepared at room temperature by remote plasma-enhanced chemical vapor deposition in a downstream reactor by using Si(CH3)3Cl as a volatile precursor and a microwave electron cyclotron resonance external source. Experiments are done at constant pressure by changing the relative amount of Ar species R in the...
Uploaded on: March 27, 2023 -
December 5, 2023 (v1)Publication
Detector de partículas ionizantes. El objeto de la presente invención es un sensor de radiación ionizante con energías comprendidas entre 0.1 keV y 100 MeV sensible tanto al tipo de radiación como a su energía. El detector comprende una estructura apilada de varias capas de material con distintos luminiscentes
Uploaded on: December 7, 2023 -
August 1, 2017 (v1)Publication
N2+ bombardment of Al2O3 has been investigated by near edge x-ray absorption fine structure spectroscopy. Two kinds of species were detected and were attributed to implanted nitrogen atoms and nitride species. These results are discussed in relation to previous attributions in the literature of these species to AlNO and AlN.
Uploaded on: March 27, 2023 -
November 13, 2015 (v1)Publication
We have studied low refractive index fluorine doped silica thin films prepared by reactive magnetron sputtering. Two experimental parameters were varied to increase the porosity of the films, the geometry of the deposition process (i.e., the use of glancing angle deposition) and the presence of chemical etching agents (fluorine species) at the...
Uploaded on: March 27, 2023 -
April 2, 2018 (v1)Publication
The influence of isotropically directed deposition flux on the formation of the thin film microstructure at low temperatures is studied. For this purpose we have deposited TiO2 thin films by two different deposition techniques: reactive magnetron sputtering, in two different experimental configurations, and plasma enhanced chemical vapor...
Uploaded on: December 4, 2022 -
February 18, 2019 (v1)Publication
Hydrogenated diamond like carbon (DLCH) thin films were deposited on medical grade ultra high molecular weight polyethylene (UHMWPE) by radio frequency plasma enhanced chemical vapor deposition. The DLCH coating thicknesses ranged from 250 to 700. nm. The substrates were disks made of UHMWPEs typically used for soft components in artificial...
Uploaded on: March 27, 2023